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Temperature and frequency characterization of InAs nanowire and HfO2 interface using capacitance-voltage method

Författare:
Publiceringsår: 2011
Språk: Engelska
Sidor: 444-447
Publikation/Tidskrift/Serie: Microelectronic Engineering
Volym: 88
Nummer: 4
Dokumenttyp: Konferensbidrag
Förlag: Elsevier Science BV

Sammanfattning

InAs/HfO2 nanowire capacitors using capacitance-voltage (CV) measurements are investigated in the range of 10 kHz to 10 MHz. The capacitors are based on vertical nanowire arrays that are coated with an 8 nm-thick HfO2 layer by atomic layer deposition. CV characteristics are measured at temperatures in the range between -140 and 40 degrees C and the CV characteristics for nanowires with different Sn and Se n-type doping levels are compared. The comparison of the data at various doping levels points towards large number of traps for highly doped samples, caused by the preferential dopant precursor incorporation at the nanowire surface. We also evaluate the frequency dispersion of the accumulation capacitance and determine values below 2% with weak temperature dependence, indicating the existence of border traps in these nanowire capacitors. (C) 2010 Elsevier B.V. All rights reserved.

Disputation

Nyckelord

  • Physics and Astronomy
  • III/V
  • Nanowire doping
  • Capacitance-voltage
  • InAs
  • Vertical wrap gate

Övriga

EMRS 2010 Spring Meeting on Post-Si-CMOS Electronic Devices - The Role of Ge and III-V Materials
2014-06-08
Strasbourg, France
Published
Yes
  • Nano
  • ISSN: 0167-9317

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