RF Characterization of Vertical InAs Nanowire Wrap-Gate Transistors Integrated on Si Substrates
- George E. Ponchak
Publikation/Tidskrift/Serie: IEEE Transactions on Microwave Theory and Techniques
Ytterligare information: Published in a Special Issue on Radio-Frequency Nanoelectronics
We present dc and RF characterization of InAs nanowire field-effect transistors (FETs) heterogeneously integrated on Si substrates in a geometry suitable for circuit applications. The FET consists of an array of 182 vertical InAs nanowires with about 6-nm HfO high-gate dielectric and a wrap-gate length of 250 nm. The transistor has a transconductance of 155 mS/mm and an on-current of 550 mA/mm at a gate voltage of 1.5 V and a drain voltage of 1 V. S-parameter measurements yield an extrinsic cutoff frequency of 9.3 GHz and a extrinsic maximum oscillation frequency of 14.3 GHz.
- Electrical Engineering, Electronic Engineering, Information Engineering
- Condensed Matter Physics
- ISSN: 0018-9480