High-Performance InAs Nanowire MOSFETs
Författare
Summary, in English
In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.
Avdelning/ar
Publiceringsår
2012
Språk
Engelska
Sidor
791-793
Publikation/Tidskrift/Serie
IEEE Electron Device Letters
Volym
33
Issue
6
Fulltext
Dokumenttyp
Artikel i tidskrift
Förlag
IEEE - Institute of Electrical and Electronics Engineers Inc.
Ämne
- Electrical Engineering, Electronic Engineering, Information Engineering
Status
Published
ISBN/ISSN/Övrigt
- ISSN: 0741-3106