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Fabrication of high aspect ratio SU-8 micropillar arrays

Författare:
  • Letizia Amato
  • Stephan S. Keller
  • Arto Heiskanen
  • Maria Dimaki
  • Jenny Emnéus
  • Anja Boisen
  • Maria Tenje (Dr)
Publiceringsår: 2012
Språk: Engelska
Sidor: 483-487
Publikation/Tidskrift/Serie: Microelectronic Engineering
Volym: 98
Nummer: Special issue MNE 2011 - Part II
Dokumenttyp: Artikel
Förlag: Elsevier

Sammanfattning

SU-8 is the preferred photoresist for development and fabrication of high aspect ratio (HAR) three dimensional patterns. However, processing of SU-8 is a challenging task, especially when the film thickness as well as the aspect ratio is increasing and the size of the features is close to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5 μm spacing) with nominal height ⩾20 μm and nominal diameter ⩽2.5 μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8 μm, AR = 11 and an improved temporal stability.

Disputation

Nyckelord

  • Chemistry
  • High-aspect ratio SU-8
  • Micropillars
  • UV photolithography

Övriga

Published
Yes
  • ISSN: 0167-9317

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