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Gold cleaning methods for electrochemical detection applications

  • Lee M. Fischer
  • Maria Tenje (Dr)
  • Arto R. Heiskanen
  • Noriyuki Masuda
  • Jaime Castillo Leon
  • Anders Bentien
  • Jenny Emnéus
  • Mogens H. Jakobsen
  • Anja Boisen
Publiceringsår: 2009
Språk: Engelska
Sidor: 1282-1285
Publikation/Tidskrift/Serie: Microelectronic Engineering
Volym: 86
Nummer: 4-6
Dokumenttyp: Artikel
Förlag: Elsevier


This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.



  • Chemistry


  • ISSN: 0167-9317

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