Fabrication and time-resolved studies of visible microdisk lasers

In English We report on the fabrication and characterization of microdisk lasers emitting at around 650 nm. The structures were grown by metalorganic vapor phase epitaxy and processed using electron beam lithography and wet etching. Time-resolved photoluminescence measurements done at low temperature show a lasing threshold of 60 muW average power. A redshift in the whispering modes energy is observed. (C) 2003 American Institute of Physics.