Javascript is not activated in your browser. This website needs javascript activated to work properly.
Du är här

Study of thin oxide films by electron, ion and synchrotron radiation beams

  • V Sammelselg
  • E Rauhala
  • K Arstila
  • Alexei Zakharov
  • J Aarik
  • A Kikas
  • J Karlis
  • A Tarre
  • A Seppala
  • J Asari
  • Indrek Martinson
Publiceringsår: 2002
Språk: Engelska
Sidor: 165-169
Publikation/Tidskrift/Serie: Microchimica Acta
Volym: 139
Nummer: 1-4
Dokumenttyp: Artikel
Förlag: Springer


Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.



  • Physics and Astronomy
  • oxide films
  • RBS
  • scanning photoelectron microscopy
  • EPMA


  • ISSN: 0026-3672

Box 117, 221 00 LUND
Telefon 046-222 00 00 (växel)
Telefax 046-222 47 20
lu [at] lu [dot] se

Fakturaadress: Box 188, 221 00 LUND
Organisationsnummer: 202100-3211
Om webbplatsen