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Study of thin oxide films by electron, ion and synchrotron radiation beams

Författare:
  • V Sammelselg
  • E Rauhala
  • K Arstila
  • Alexei Zakharov
  • J Aarik
  • A Kikas
  • J Karlis
  • A Tarre
  • A Seppala
  • J Asari
  • Indrek Martinson
Publiceringsår: 2002
Språk: Engelska
Sidor: 165-169
Publikation/Tidskrift/Serie: Microchimica Acta
Volym: 139
Nummer: 1-4
Dokumenttyp: Artikel
Förlag: Springer

Sammanfattning

Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.

Disputation

Nyckelord

  • Physics and Astronomy
  • oxide films
  • TOF-ERDA
  • RBS
  • scanning photoelectron microscopy
  • EPMA

Övriga

Published
Yes
  • ISSN: 0026-3672

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