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Tunneling Based Electronic Devices

Publiceringsår: 2004
Språk: Engelska
Sidor: 126
Dokumenttyp: Doktorsavhandling
Förlag: Solid State Physics, Box 118, 221 00 Lund, Sweden,
Ytterligare information: Article: E. Lind et. al., IEEE Trans. Electron Devices 49, 1066 (2002).E. Lind et. al., Appl. Phys. Lett. 81, 1905 (2002).E. Lind et. al., Phys. Rev. B 68, 033312 (2003).L.-E. Wernersson et. al., Electron. Lett. 40, 83 (2004).L.-E. Wernersson et. al., Manuscript.E. Lind et. al., IEEE Electron Device Lett. 25, 678 (2004).L.-E. Wernersson et. al., Int. J. Circuit Theory and Applications 32, 431 (2004).


This thesis concerns different kinds of tunneling based devices all showing negative differential resistance. The thesis is divided in three parts, resonant tunneling transistors, Esaki diodes and coupled zero dimensional systems.

The resonant tunneling transistors are GaAs-based vertical field effects transistors, based on a combination of overgrown tungsten gates and double barrier heterostructures. The gate is placed in direct vicinity of the heterostructure, and due to Schottky depletion around the gate the effective conducting area of the heterostructure can be controlled. Transistors based on two different double barriers have been investigated, GaAs0.3P0.7 and Al0.8Ga0.2As/GaAs/In0.2Ga0.8As. The GaAsP-system were used for low temperature operation, whereas the AlGaAs was optimized for room temperature functionality. For resonant tunneling diode structures, a peak current density of 70 kA/cm2, a peak-to-valley ratio of 4 with a peak voltage of 0.3V was obtained, all at room temperature. The transistors has a simultaneously a maximum transconductance gm=120 mS/mm, and a peak-to-valley ratio of 2.5. Further on, a transistor based on three dimensional integration of two resonant tunnel diodes and a single metallic gate has been demonstrated.

The same technology has also been used to fabricate structures for coupled low dimensional systems. Studies of transport between a single impurity and an electrostatically defined quantum dot were preformed at a temperature T=0.3 K and B-fields up to 12 T. The resulting data shows that the angular momentum of the electrons are conserved during the tunneling event.

SiGe Esaki Tunnel Diodes has been fabricated using a combined approach of ultra high vacuum chemical vapor deposition epitaxial growth and proximity rapid thermal diffusion. This process is suitable for integration of tunnel diodes with mainstream SiGe-technology. The diodes shows a peak current density of 0.18 kA/cm2 and a peak-to-valley ratio of 2.6 at room temperature.


Lecture hall B, Dept of Physics, Sölvegatan 14, Lund Institute of Technology
  • Hans Lüth (Prof)


  • Condensed Matter Physics
  • Electrical Engineering, Electronic Engineering, Information Engineering
  • SiGe
  • Esaki Diodes
  • classical mechanics
  • quantum mechanics
  • relativity
  • termodynamik
  • relativitet
  • kvantmekanik
  • statistisk fysik
  • Matematisk och allmän teoretisk fysik
  • thermodynamics
  • gravitation
  • statistical physics
  • GaAs
  • Mathematical and general theoretical physics
  • Resonant Tunneling Permeable Base Transistors
  • Resonant Tunneling Diodes
  • klassisk mekanik
  • Fysicumarkivet A:2004:Lind


  • ISBN: 91-628-6226-X

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