Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation

Summary, in English

We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h-BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h-BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h-BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.

• Författare: May Ling Ng; Andrey Shavorskiy; Christoph Rameshan; Anders Mikkelsen; Edvin Lundgren; Alexei Preobrajenski; Hendrik Bluhm
• Avdelning/ar: Synkrotronljusfysik; MAX IV-laboratoriet; NanoLund: Centre for Nanoscience
• Publiceringsår: 2015
• Språk: Engelska
• Sidor: 923-927
• Publikation/Tidskrift/Serie: ChemPhysChem
• Volym: 16
• Issue: 5
• Länkar: http://dx.doi.org/10.1002/cphc.201500031
• Dokumenttyp: Artikel i tidskrift
• Förlag: John Wiley & Sons Inc.
• Ämne: Physical Sciences; Natural Sciences; Atom and Molecular Physics and Optics
• Nyckelord: boron nitride; CO; electronic properties; intercalation; monolayers
• Status: Published
• ISBN/ISSN/Övrigt: ISSN: 1439-7641