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Metalorganic vapor phase epitaxy-grown GaP/GaAs/GaP and GaAsP/GaAs/GaAsP n-type resonant tunnelling diodes

Publiceringsår: 2002
Språk: Engelska
Sidor: 1841-1843
Publikation/Tidskrift/Serie: Applied Physics Letters
Volym: 80
Nummer: 10
Dokumenttyp: Artikel i tidskrift
Förlag: American Institute of Physics


We have studied GaP/GaAs/GaP and GaAsxP1-x/GaAs/GaAsxP1-x double-barrier resonant tunnelling diodes grown by metalorganic vapor phase epitaxy. We find that GaP tensile strained barriers in GaP/GaAs/GaP diodes may be grown with a barrier thickness below the critical thickness of about 12 monolayers. However, a corrugation of the strained barrier is observed by transmission electron microscopy. This variation may explain the low peak-to-valley ratio of the diodes (about 2). In contrast, GaAsxP1-x/GaAs/GaAsxP1-x resonant tunnelling diodes have been grown with a homogeneous thickness of the barriers, consequently showing a substantially improved electrical performance compared to the GaP diodes with peak-to-valley ratios >5.


  • Condensed Matter Physics
  • Electrical Engineering, Electronic Engineering, Information Engineering


  • ISSN: 0003-6951

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