Dissociative NH3 adsorption on the Si(100)2 × 1 surface at 300 K

Summary, in English

High resolution electron energy loss spectroscopy has been used to determine how NH3 adsorbs on the Si(100)2 × 1 surface at 300 K. We find that the NH3 molecules dissociate into NH2 and H on adsorption. Combination bands, overtones and double losses for the Si---NH2 group are observed. An anneal to 800 K is sufficient to dissociate the adsorbed NH2 groups while the majority of the Si---H bonds remain intact. An anneal to 1100 K is enough to break the Si-H bonds and start the formation of silicon nitride.

• Författare: Christer Larsson; Anders Flodström
• Publiceringsår: 1991
• Språk: Engelska
• Sidor: 353-356
• Publikation/Tidskrift/Serie: Surface Science
• Volym: 241
• Issue: 3
• Länkar: http://dx.doi.org/10.1016/0039-6028(91)90095-A
• Dokumenttyp: Artikel i tidskrift
• Förlag: Elsevier
• Ämne: Electrical Engineering, Electronic Engineering, Information Engineering
• Status: Published
• Forskningsgrupp: Electromagnetic theory
• ISBN/ISSN/Övrigt: ISSN: 0039-6028