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Memristive and Memcapacitive Characteristics of a Au/Ti-HfO2-InP/InGaAs Diode

Publiceringsår: 2011
Språk: Engelska
Sidor: 131-133
Publikation/Tidskrift/Serie: IEEE Electron Device Letters
Volym: 32
Nummer: 2
Dokumenttyp: Artikel
Förlag: IEEE

Sammanfattning

This letter reports on room-temperature electrical measurements of a Au/Ti-HfO2-InP/InGaAs diode fabricated by atomic layer deposition and electron beam lithography. At forward bias voltages, the diode shows memristor characteristics, whereas at reverse bias voltages, the diode can be characterized as a memcapacitor. A parasitic accumulation layer of charges formed at the high-kappa oxide/InP interface is shown to be the cause for the phenomena. The operation of the diode as a rewritable memory cell is also demonstrated. The results highlight novel memristive and memcapacitive properties of high-kappa dielectrics on III-V semiconductors and their potential applications in nanoelectronics.

Disputation

Nyckelord

  • Technology and Engineering
  • High-kappa HfO2
  • InP/InGaAs
  • memcapacitors
  • memristors
  • nanoelectronics

Övriga

Published
Yes
  • Nano
  • ISSN: 0741-3106

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