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Sloped side walls in SU-8 structures with ‘Step-and-Flash’ processing

Författare:
Publiceringsår: 2006
Språk: Engelska
Sidor: 1269-1272
Publikation/Tidskrift/Serie: Microelectronic Engineering
Volym: 83
Nummer: 4/9
Dokumenttyp: Artikel
Förlag: Elsevier

Sammanfattning

We present a fast fabrication technique to achieve SU-8 structures with sloped side walls. We investigate the method of ‘Step-and-Flash’ which combines hot embossing with UV sensitive materials. The stamps are fabricated in Si by KOH etching to achieve mesa structures with side walls at a 54.7° angle to the bottom. These stamps are imprinted into SU-8-coated Pyrex wafers during the soft bake step of the SU-8 processing, under ambient conditions. The SU-8 is exposed through the Pyrex wafer and after a post exposure bake the stamp can be removed as the SU-8 is cross-linked – leaving stamp replicates in the SU-8. We have optimized the method and show that further processing of the structures is possible. We believe this method to be highly suitable for pattering sloped side wall structures in SU-8 as it can easily be incorporated into a standard SU-8 fabrication scheme without adding further process steps, as well as performed under ambient conditions.

Disputation

Nyckelord

  • Technology and Engineering

Övriga

Published
Yes
  • ISSN: 0167-9317

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