Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.
Författare
Summary, in English
Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.
Avdelning/ar
- Fasta tillståndets fysik
- Department of Food Technology, Engineering and Nutrition
- NanoLund: Centre for Nanoscience
Publiceringsår
2011
Språk
Engelska
Publikation/Tidskrift/Serie
Nanotechnology
Volym
22
Issue
18
Länkar
Dokumenttyp
Artikel i tidskrift
Förlag
IOP Publishing
Ämne
- Nano Technology
Status
Published
ISBN/ISSN/Övrigt
- ISSN: 0957-4484